> ## Content Index
> Fetch the complete content index at: https://www.nupath.eu/llms.txt
> Use this file to discover other available public pages before exploring further.

# Intel begins using ASML’s $400M High-NA EUV machine
- URL: https://www.nupath.eu/intel-begins-using-asmls-400m-high-na-euv-machine/
- Published: 2026-07-20T06:30:31.000Z
- Updated: 2026-07-20T06:30:31.000Z
- Author: Christian Triantafillou Schade
- Tags: News, #source_Cyprus-Mail

Intel has started deploying ASML’s next-generation High-NA extreme ultraviolet lithography machine, costing $400 million, to produce portions of its Panther Lake processors. The tool, twice the price of standard EUV machines, is technically demanding but essential for future chip scaling, reinforcing ASML’s dominance in advanced chipmaking equipment. **(CYPRUS MAIL)**

[Intel deploys ASML’s $400 million next-gen machine for flagship chip productionIntel has begun using ASML’s next-generation High-NA extreme ultraviolet (EUV) machines to produce portions of its Panther Lake processors. The $400M tool, twice the cost of standard EUV machines, is technically challenging but essential for future chip scaling. The deployment highlights ASML’s pivotal role in the semiconductor supply chain and Europe’s strategic leverage in advanced chipmaking.![](https://www.google.com/s2/favicons?domain=https://cyprus-mail.com/2026/07/20/intel-deploys-asmls-400-million-next-gen-machine-for-flagship-chip-production&sz=64)Cyprus Mail![](https://cyprus-mail.com/wp-content/uploads/2026/04/intel.jpg)](https://cyprus-mail.com/2026/07/20/intel-deploys-asmls-400-million-next-gen-machine-for-flagship-chip-production?ref=nupath.eu)